vapour deposition meaning in English
气相淀积法;汽相淀积
Examples
- specifications of physical vapour deposition tin films
物理气相沉积tin薄膜技术条件 - chemical vapour deposition
和化学气相淀积 - productive technology of iron oxide-mica pearlescent pigment by metal organic chemistry vapour deposition
法制备铁系云母珠光颜料 - the desensitized explosive petn film was prepared by physical vapour deposition ( pvd ) technology, and sem was used to analyze the microstructure and grain size of petn film
摘要采用物理气相沉积(pvd)技术研制了钝化太安炸药薄膜，对薄膜的微观结构和颗粒粒度进行了分析，对颗粒粒度与薄膜爆轰波稳定传播临界尺寸的关系进行了探索。 - this paper has discussed preparing diamond-like carbon films by means of micro-wave ecr plasma source ion implantation and plasma enhanced chemical vapour deposition . we use the raman spectrum, ft-ir, afm and so on to study the dlc film . the result indicates : different bias voltage, frequency and gas flow rate of psii will have impact on sp3 proportion of dlc films, we find high bias voltage, low frequency and moderate gas flow rate can prepare high sp3 proportion dlc films; we simply illustrate the influence of bias voltage on sp3 proportion of dlc films in pecvd
研究结果表明：在全方位离子注入技术中，不同的偏压、频率、气体流量都对薄膜中sp~3键比例有所影响，文中对具体的影响进行了分析，发现偏压的增加、频率的降低和适中的气体流量可以制备出sp~3键比例高的类金刚石膜；在等离子增强化学气相沉积技术中，对偏压对sp~3键比例的影响也进行了简单分析。